Optics: measuring and testing – Lens or reflective image former testing
Reexamination Certificate
2006-03-28
2006-03-28
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
Lens or reflective image former testing
Reexamination Certificate
active
07019824
ABSTRACT:
In the case of a method and a measuring system for measuring the distortion of an optical imaging system with the aid of moiré patterns, an object grating with an object pattern is arranged in the object plane of the imaging system, and an image grating with an image pattern is arranged in the image plane of the imaging system. Both the object pattern and the image pattern in each case have a multiplicity of cells with sub-gratings of different grating properties, it being possible, in particular, for the sub-gratings to have different directions of periodicity and different phase angles. The object pattern and the image pattern are coordinated with one another in such a way that, when the object pattern is projected onto the image pattern with the aid of the imaging system, images of the sub-gratings of the object pattern superimpose in each case with assigned sub-gratings of the image pattern, accompanied by the generation of moiré sub-patterns, which are likewise present in the form of cells situated next to one another. As a result, it is possible simultaneously to determine distortion components for a plurality of image directions aligned transverse to one another. It is preferred to use phase-shift methods in order to evaluate the moiré sub-pattern.
REFERENCES:
patent: 1590532 (1926-06-01), Lenouvel
patent: 4386849 (1983-06-01), Häeusler et al.
patent: 5062705 (1991-11-01), Sato et al.
patent: 5621497 (1997-04-01), Terasawa et al.
patent: 5759744 (1998-06-01), Brueck et al.
patent: 5767959 (1998-06-01), Kobayashi
patent: 5834767 (1998-11-01), Hasegawa et al.
patent: 5973773 (1999-10-01), Kobayashi
patent: 6236488 (2001-05-01), Shimizu et al.
patent: 6717661 (2004-04-01), Bernstein et al.
patent: 6816247 (2004-11-01), Heppner et al.
patent: 2002/0033936 (2002-03-01), Shiraishi
patent: 2002/0080365 (2002-06-01), Monshouwer et al.
patent: 0 418 054 (1991-03-01), None
J. Schwider et al, “Digital wave-front measuring interferometry: some systematic error sources,” Applied Optics, Nov. 1, 1983, pp. 3421-3432, vol. 22, No. 21.
K. Hibino et al., “Phase-shifting algorithms for nonlinear and spatially nonuniform phase shifts,” J. Opt. Soc. Am. A, Apr. 1997, pp. 918-930, vol. 14, No. 4.
J. Schmidt et al., “Window function influence on phase error in phase-shifting algorithms,” Applied Optics, Oct. 1, 1996, pp. 5642-5649, vol. 35, No. 28.
Klaesges Ralph
Schellhorn Uwe
Stuehler Joachim
Wegmann Ulrich
Carl Zeiss SMT AG
Pham Hoa Q.
Sughrue & Mion, PLLC
LandOfFree
Moire method and measuring system for measuring the... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Moire method and measuring system for measuring the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Moire method and measuring system for measuring the... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3534371