Stock material or miscellaneous articles – Composite – Of silicon containing
Reexamination Certificate
2006-03-14
2006-03-14
Robertson, Jeffrey B. (Department: 1712)
Stock material or miscellaneous articles
Composite
Of silicon containing
C426S131000, C427S101000, C427S387000, C427S470000, C427S489000, C427S494000, C427S495000, C427S508000, C427S515000, C427S595000
Reexamination Certificate
active
07011890
ABSTRACT:
A method for depositing a low dielectric constant film is provided. The low dielectric constant film includes alternating sublayers, which include at least one carbon-doped silicon oxide sublayer. The sublayers are deposited by a plasma process than includes pulses of RF power. The alternating sublayers are deposited from two or more compounds that include at least one organosilicon compound. The two or more compounds and processing conditions are selected such that adjacent sublayers have different and improved mechanical properties.
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Nguyen Son Van
Zheng Yi
Applied Materials Inc.
Patterson & Sheridan
Robertson Jeffrey B.
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