Modular uniform gas distribution system in an ion source

Details Modular uniform gas distribution system in an ion source Modular uniform gas distribution system in an ion source

2005-07-19

2005-07-19

Tran, Thuy V. (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

C156S345330

Reexamination Certificate

active

06919690

ABSTRACT:
A modular ion source design relies on relatively short modular anode layer source (ALS) components, which can be coupled together to form a longer ALS. For long ion sources, these shorter modular components allow for easier manufacturing and further result in a final assembly having better precision (e.g., a uniform gap dimensions along the longitudinal axis of the ion source). Modular components may be designed to have common characteristics so as to allow use of these components in ion sources of varying sizes. A modular gas distribution system uniformly distributes a working gas to the ionization region of the module ion source. For each gas distribution module, gas distribution channels and baffles are laid out relative to the module joints to prevent gas leakage. Furthermore, gas manifolds and supply channels are used to bridge module joints while uniformly distributing the working gas to the ALS.

REFERENCES:
patent: 5624498 (1997-04-01), Lee et al.
patent: 5763989 (1998-06-01), Kaufman
patent: 5781693 (1998-07-01), Ballance et al.
patent: 6002208 (1999-12-01), Maishev
patent: 6037717 (2000-03-01), Maishev
patent: 6130507 (2000-10-01), Maishev
patent: 6147354 (2000-11-01), Maishev
patent: 6153067 (2000-11-01), Maishev
patent: 6214183 (2001-04-01), Maishev
patent: 6236163 (2001-05-01), Maishev
patent: 6238526 (2001-05-01), Maishev
patent: 6242749 (2001-06-01), Maishev
patent: 6246059 (2001-06-01), Maishev
patent: 6250250 (2001-06-01), Maishev
patent: 6359388 (2002-03-01), Petrmichl
patent: 6368664 (2002-04-01), Veerasamy et al.
patent: 6454901 (2002-09-01), Sekiya et al.
patent: 6454910 (2002-09-01), Zhurin et al.
patent: 6537418 (2003-03-01), Muller et al.
patent: 6612105 (2003-09-01), Voigt et al.
patent: 6645301 (2003-11-01), Sainty
patent: 6777030 (2004-08-01), Veerasamy et al.
patent: 6808606 (2004-10-01), Thomsen et al.
patent: 6815690 (2004-11-01), Veerasamy et al.
patent: 6849854 (2005-02-01), Sainty
Dr. John Keem, High Current Density Anode Layer Ion Sources, 44th Annual Technical Conference Proceedings, 2001, pp. 1-6, Society of Vacuum Coaters.
D. Burtner, Linear Anode-Layer Ion Sources With 340- and 1500-mm Beams, 46th Annual Technical Conference Proceedings, May 2003, pp. 61-66, Society of Vacuum Coaters.
V. Dudnikov, Ion Source With Closed Drift Anode Layer Plasma Acceleration, Review of Scientific Instruments, Feb. 2002, pp. 729-731, vol. 73 No. 2, American Institute of Physics.
V. Zhurin, Physics of Closed Drift Thrusters, Plasma Sources Sci. Technol. 8, 1999, pp. R1-R20, IOP Publishing Ltd., UK.
N. Vershinin, Hall Current Accelerator For Pre-Treatment of Large Area Glass Sheets, Coatings on Glass, 1999, pp. 283-286.
V. Baranov, Energy Model and Mechanisms of Acceleration Layer Formation For Hall Thrusters, 33rd Joint Propulsion Conference, Jul. 1997, pp. 1-8, AIAA 97-3047, Reston, VA.
A. Zharinov, Acceleration of Plasma by a Closed Hall Current, Soviet Physics—Technical Physics, Aug. 1967, pp. 208-211, vol. 12 No. 2, Russia.
A. Semenkin, Investigation of Erosion in Anode Layer Thrusters and Elaboration High Life Design Scheme, 23rd Intl Electric Propulsion Conf., Sep. 1993, pp. 1-6, IEPC-93-231.
L. Lou, Application Note: Ion Source Precleaning, Advanced Energy, Mar. 2001, pp. 1-4, Fort Collins, CO.
Plasma Surface Engineering Corporation, Compound Ion Beam-Magnetron Sputtering Source, Product Specification: I-Mag, Feb. 2003, pp. 1-5, San Diego, CA.
A. Shabalin, Whitepaper: Industrial Ion Sources and Their Application for DLC Coating, SVC 42nd Annual Technical Conference, Jan. 2001, pp. 1-4, Fort Collins, CO.
Advanced Energy, Ion Beam Sources, [online], Aug. 2002, [retrieved on Dec. 6, 2004], Retrieved from the Advanced Energy company website using Internet <URL: http://www.advanced-energy.com/upload/sl-ion-230-02.pdf>, pp. 1-6, Fort Collins, CO.
Vecor, Vacuum Equipment Coatings and Optics from Russia, [online], last updated on Apr. 22, 2004, [retrieved on Dec. 6, 2004], Retrieved from the Advanced Energy company website using Internet <URL: http://www.vecorus.com/welcom.htm>, Moscow, Russia.
Vecor, Vacuum Equipment Coatings and Optics from Russia, Magnetrons Ion Sources and Accessories, [online], last updated on Apr. 22, 2004, [retrieved on Dec. 6, 2004], Retrieved from the Advanced Energy company website using Internet <URL: http://www.vecorus.com/magionsource.htm>, Moscow, Russia.

Affiliated with

Also associated with

Rating

Modular uniform gas distribution system in an ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Modular uniform gas distribution system in an ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Modular uniform gas distribution system in an ion source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3378040