Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-08-07
1998-01-06
Breneman, R. Bruce
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429803, 20429807, 20429809, 20429815, 20429818, 20429817, 20429819, 2042982, 20429823, 20429827, C23C 1434, C23C 1456
Patent
active
057050449
ABSTRACT:
A flexible, modular sputtering machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a sputtering station including a serial sputtering chamber and an interchamber disk transfer mechanism. The disks move in batches along the process path, being individually processed only at the sputtering chamber. A preferred sputtering source is also provided which allows selective sputtering of multiple materials within a single sputtering chamber. The selection of sputtering materials is controlled by varying the magnetic field within the sputtering chamber. A cassette for transporting and holding batches of disk substrates during batch processing allows individual access to the disks for the interchamber disk transfer mechanism.
REFERENCES:
patent: 4401539 (1983-08-01), Abe et al.
patent: 4569746 (1986-02-01), Hutchinson
patent: 4701251 (1987-10-01), Beardow
patent: 4756815 (1988-07-01), Turner et al.
patent: 4786564 (1988-11-01), Chen et al.
patent: 4810346 (1989-03-01), Wolf et al.
patent: 4869802 (1989-09-01), Wirz et al.
patent: 4911810 (1990-03-01), Lauro et al.
patent: 4971674 (1990-11-01), Hata
patent: 5033406 (1991-07-01), Lee
patent: 5106470 (1992-04-01), Takei et al.
patent: 5126027 (1992-06-01), Kudo et al.
patent: 5174875 (1992-12-01), Hurwitt et al.
patent: 5180478 (1993-01-01), Hughes
patent: 5215420 (1993-06-01), Hughes et al.
patent: 5228968 (1993-07-01), Zejda
patent: 5244554 (1993-09-01), Yamagata et al.
patent: 5262030 (1993-11-01), Potter
patent: 5316864 (1994-05-01), Hedgcoth
patent: 5512150 (1996-04-01), Bourez et al.
Abe et al. "Planar Magnetron Sputtering Cathode With Deposition Rate Distribution Controllability," Thin Solid Films, 96:225-233 (1982).
Hamilton Jarrett L.
Washburn Hudson A.
Akashic Memories Corporation
Breneman R. Bruce
McDonald Rodney G.
LandOfFree
Modular sputtering machine having batch processing and serial th does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Modular sputtering machine having batch processing and serial th, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Modular sputtering machine having batch processing and serial th will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2325801