Modified horizontal bridgman method for growing GaAs single crys

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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1566202, 156DIG70, 156DIG89, 156DIG81, C30B 1104, C30B 2940, C30B 2942, C30B 2944

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049023764

ABSTRACT:
A process for growing a gallium arsenide single crystal from a polycrystalline gallium arsenide by the horizontal Bridgman technique includes (a) melting the polycrystalline gallium arsenide in a quartz boat which is placed in a quartz tube, at a temperature greater than 1238 deg C. but lower than the melting point of quartz, (b) decreasing the temperature of the melt of gallium arsenide from the seed/melt interface by moving a furnace to crystallize the melt, and (c) annealing the crystallized gallium arsenide during the crystal growth process at a temperature of 1100-1220 deg C.; wherein the above steps are carried out in the absence of an As vapor pressure controlling zone which is kept at a temperature of about 617 deg C. Due to the anealing step, the thermal stress is small and the dislocation hardly occurs. A short quartz tube can be employed due to the absence of the As zone.

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patent: 3520810 (1970-07-01), Plaskett et al.
patent: 3623905 (1971-11-01), Akai et al.
patent: 3690847 (1972-09-01), Merkel et al.
patent: 3767473 (1973-10-01), Ayel et al.
patent: 3877883 (1975-04-01), Berkman et al.

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