Modified cation exhange process

Details Modified cation exhange process Modified cation exhange process

1993-09-30

1996-11-05

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

528480, 210681, 210688, G03C 173

Patent

active

055716571

ABSTRACT:
The invention is a process of removing metal ion contaminants from an organic solution, especially one having acid labile components. The process comprises modifying a cationic exchange resin by treatment with ammonia or amine and contacting said modified ion exchange resin with an organic solution containing metal ion contaminants. The process is especially useful for treating photoresist compositions.

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patent: 5234789 (1993-08-01), Favier, Jr. et al.
patent: 5300628 (1994-04-01), Honda
patent: 5378802 (1995-01-01), Honda
patent: 5446125 (1995-08-01), Honda et al.
Honda, Kenji. "Removal of metal impurity from resist materials", JP 5-234876A2, Sep. 10, 1993.

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