Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2010-02-18
2010-12-14
Levin, Naum B (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C430S005000
Reexamination Certificate
active
07853919
ABSTRACT:
An embodiment provides systems and techniques for determining an improved process model which models mask corner rounding (MCR) effects. During operation, the system may receive a mask layout and process data which was generated by applying a photolithography process to the mask layout. The system may also receive an uncalibrated process model which may contain a set of MCR components. Next, the system may identify a set of corners in the mask layout. The system may then determine a set of mask layers, wherein at least some of the mask layers correspond to the MCR components. Next, the system may determine an improved process model by calibrating the uncalibrated process model using the set of mask layers, and the process data.
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Huang Jensheng
Kuo Chun-chieh
Melvin, III Lawrence S.
Levin Naum B
Park Vaughan Fleming & Dowler LLP
Sahasrabuddhe Laxman
Synopsys Inc.
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