Coating apparatus – Gas or vapor deposition – Chamber seal
Patent
1989-08-03
1991-09-24
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Chamber seal
118715, C23C 1600
Patent
active
050505343
ABSTRACT:
A mobile injector system with a CVD door assembly including flexible tubing secured to the door, a hole for accommodating a SiC or like paddle, and an injector clamp securing the injector tubes to the paddle. The CVD door assembly mates to a gas ring. A gas inlet channel extends through the CVD door assembly to communicate with the flexible tubing and with the injector tubes. The gas ring secures to a back ring and over and about an annular flange on the end of a process tube. Gas inlet channels extend through the gas ring to connect to gas inlet couplings to communicate with gas inlet ports in the CVD door. The injector tubes are in a predetermined geometrical proximity to the paddle, and provide for repeatability of processes for the semiconductor wafers or substrates.
REFERENCES:
patent: 4466381 (1984-08-01), Jenkins
patent: 4751895 (1988-06-01), Yates
patent: 4793283 (1988-12-01), Sarkozy
patent: 4911638 (1990-03-01), Bayne
Bueker Richard
CRYCO Twenty-Two, Inc.
Jaeger Hugh D.
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