Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1995-12-04
1998-01-13
Baxter, Janet C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430315, 4302861, G03C 556, G03C 160
Patent
active
057077835
ABSTRACT:
Top surface imaging by silylation of organic photoresists for use in lithographic techniques for the manufacture of microelectronic devices is improved by the use of certain mixtures of organosilane silylating agents. The mixture includes a monofunctional silane in combination with a di- or polyfunctional silane, selected such that the boiling points are the same or very close to each other to facilitate a vapor-phase reaction. Silylation with this mixture provides effective penetration of the silane into the resist without causing so much lowering of the glass transition temperature of the resist that the resist flows under the processing steps and distorts the pattern.
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Peterson William R.
Stauffer Craig M.
Ashton Rosemary
Baxter Janet C.
Complex Fluid Systems, Inc.
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