Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1980-12-24
1982-03-30
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
20415915, 20415916, 20415922, 430281, 430287, 430288, 526306, 526315, 526316, 526321, 526322, G03C 168
Patent
active
043224911
ABSTRACT:
This invention relates to an improvement in a mixture which is polymerizable by radiation and contains, as the essential constituents, (a) a polymeric binder, (b) a polymerization initiator which can be activated by radiation, and (c) a compound of the formula I ##STR1## in which R.sub.1 is a divalent aliphatic group having 1 to 15 carbon atoms which also can be partially replaced by hetero-atoms, a divalent cycloaliphatic group having 3 to 15 carbon atoms, or a mixed aliphatic-aromatic group having 7 to 15 carbon atoms, and A is an electron-attracting radical. The invention also relates to a radiation-sensitive resist material using the improved radiation-polymerizable mixture.
REFERENCES:
patent: 2437421 (1948-03-01), D'Alelio
patent: 2445379 (1948-07-01), Young et al.
patent: 3748131 (1973-07-01), Reynolds et al.
patent: 4048035 (1977-09-01), Ide et al.
patent: 4225661 (1980-09-01), Muzyczko
patent: 4232106 (1980-11-01), Iwasaki et al.
Horn Klaus
Sander Jurgen
Brammer Jack P.
Bryan James E.
Hoechst Aktiengesellschaft
LandOfFree
Mixture which is polymerizable by radiation, and radiation-sensi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mixture which is polymerizable by radiation, and radiation-sensi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mixture which is polymerizable by radiation, and radiation-sensi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-382983