Mixture for doping semiconductors

Details Mixture for doping semiconductors Mixture for doping semiconductors

2006-05-31

2011-10-25

Choi, Ling (Department: 1761)

Semiconductor device manufacturing: process

Introduction of conductivity modifying dopant into...

C438S558000, C257S607000, C106S287170, C106S287180, C106S287290

Reexamination Certificate

active

08043946

ABSTRACT:
A doping mixture for coating semiconductor substrates which are then subjected to a high temperature treatment to form a doped layer includes at least one p- or n-dopant, water and a mixture of two or more surfactants. At least one of the surfactants is nonionic. Also, provided are a method for producing such a doping mixture and the use thereof.

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