Mixing and matching method and integration system for...

Details Mixing and matching method and integration system for... Mixing and matching method and integration system for...

2005-08-01

2009-02-17

Lin, Sun J (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07493588

ABSTRACT:
A mixing-and-matching method for an optical environment group is disclosed in this invention. The optical environment group has at least a primary optical environment having a first numerical aperture (NA) and a first off-axis illumination (OAI) mode and at least one backup optical environment having a second NA and a second OAI mode. The method comprises steps of providing information including a first critical dimension behavior on a mask (a first MCD behavior) with respect to a design rule and a first critical dimension behavior on a developed photoresist (a first DCD behavior) obtained by using the primary optical environment with the mask and modifying the first MCD behavior to be a second MCD behavior according to the information, wherein a second DCD behavior obtained by using the backup optical environment with the modified mask having the second MCD behavior is as same as the first DCD behavior.

REFERENCES:
patent: 6699627 (2004-03-01), Smith et al.
patent: 7013439 (2006-03-01), Robles et al.
patent: 7093229 (2006-08-01), Pang et al.
patent: 7142283 (2006-11-01), Shiozawa
patent: 7245356 (2007-07-01), Hansen
patent: 7318214 (2008-01-01), Prasad et al.
patent: 2005/0003278 (2005-01-01), Hwang et al.

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