Misted precursor deposition apparatus and method with improved m

Details Misted precursor deposition apparatus and method with improved m Misted precursor deposition apparatus and method with improved m

1998-08-03

2000-11-07

Brunsman, David

Compositions: coating or plastic

Coating or plastic compositions

Heavy metal compound containing

10628719, C09D 500

Patent

active

061430633

ABSTRACT:
A substrate is located within a deposition chamber, the substrate defining a substrate plane. A liquid precursor is misted by ultrasonic or venturi apparatus, to produce a colloidal mist. The mist is generated, allowed to settle in a buffer chamber, filtered through a system up to 0.01 micron, and flowed into the deposition chamber between the substrate and barrier plate to deposit a liquid layer on the substrate. The liquid is dried to form a thin film of solid material on the substrate, which is then incorporated into an electrical component of an integrated circuit.

REFERENCES:
patent: 5456945 (1995-10-01), McMillan et al.
patent: 5688565 (1997-11-01), McMillan et al.
patent: 5849071 (1998-12-01), Derbenwick et al.

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