Misted deposition method of fabricating layered superlattice mat

Details Misted deposition method of fabricating layered superlattice mat Misted deposition method of fabricating layered superlattice mat

1995-06-07

1997-11-18

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of coating supply or source outside of primary...

427 96, 427294, 4273831, 427424, 427427, 427477, 427561, 427600, B05D 300

Patent

active

056885652

ABSTRACT:
A precursor liquid comprising several metal 2-ethylhexanoates, such as stroritium tantalum and bismuth 2-ethylhexanoates, in a xylenes/methyl ethyl ketone solvent is prepared, a substrate is placed within a vacuum deposition chamber, the precursor liquid is misted, and the mist is flowed into the deposition chamber while maintaining the chamber at ambient temperature to deposit a layer of the precursor liquid on the substrate. The liquid is dried, baked, and annealed to form a thin film of a layered superlattice material, such as strontium bismuth tantalate, on the substrate. Then an integrated circuit is completed to include at least a potion of the layered superlattice material film in a component of the integrated circuit.

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