Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1993-02-26
1998-09-15
Loke, Steven H.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257344, 257900, H01L 2976, H01L 2994, H01L 27088
Patent
active
058083472
ABSTRACT:
A MIS transistor has a semiconductor substrate of a first conduction type; a gate insulation film and a gate electrode which are selectively formed on the semiconductor substrate; an insulating film formed on the side surface of the gate electrode and on the semiconductor substrate; a first gate side wall layer provided on the upper surface and side surface of the insulating film and having a dielectric constant greater than that of the insulating film, the first gate side wall layer having a height smaller than that of the gate electrode; and a second gate side wall layer composed of an insulating film which covers the first gate side wall layer. This MIS transistor can be produced by a known LSI production technique employing self-alignment, without increasing the number of the steps of the process.
REFERENCES:
patent: 4545114 (1985-10-01), Ito et al.
patent: 4808543 (1989-02-01), Thomas et al.
patent: 4818334 (1989-04-01), Shuartzman et al.
patent: 4951100 (1990-08-01), Parrillo
patent: 4994404 (1991-02-01), Sheng et al.
patent: 5013675 (1991-05-01), Shen et al.
patent: 5073514 (1991-12-01), Ito et al.
IEEE Electron Device Letters, vol. 11, No. 2, Feb. 1990, "Simple Gate-to-Drain Overlapped MOSFET's Using Poly Spacers for High Immunity to Channel Hot--Eletron Degradation" by Chen et al., pp. 78-81.
Hiroki Akira
Kurimoto Kazumi
Odanaka Shinji
Loke Steven H.
Matsushita Electric - Industrial Co., Ltd.
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