MIS semiconductor device having a tapered top gate and a capacit

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

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257348, 257349, 257350, 257310, 257 59, 257 72, 257741, 257763, H01L 2900

Patent

active

061147281

ABSTRACT:
The invention is concerned with the fabrication of a MIS semiconductor device of high reliability by using a low-temperature process. Disclosed is a method of fabricating a MIS semiconductor device, wherein doped regions are selectively formed in a semiconductor substrate or a semiconductor thin film, provisions are then made so that laser or equivalent high-intensity light is radiated also onto the boundaries between the doped regions and their adjacent active region, and the laser or equivalent high-intensity light is radiated from above to accomplish activation.

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