Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2008-04-23
2010-12-14
Lin, Sun J (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000
Reexamination Certificate
active
07853913
ABSTRACT:
A method and apparatus for fabricating integrated circuits providing a desired operation using a plurality of masks, wherein each of said plurality of masks is used to control a corresponding one of a plurality of layers to form said integrated circuits. Said method includes incorporating a plurality of dummy stacks along with a functional block, said functional block providing said desired operation, each of said dummy stack providing a point of common connectivity on a plurality of metal layers comprised in said plurality of layers.
REFERENCES:
patent: 5432999 (1995-07-01), Capps et al.
patent: 5949299 (1999-09-01), Harada
patent: 6232662 (2001-05-01), Saran
patent: 6265778 (2001-07-01), Tottori
patent: 6291331 (2001-09-01), Wang et al.
patent: 6717267 (2004-04-01), Kunikiyo
patent: 6768151 (2004-07-01), Kasai
patent: 7015582 (2006-03-01), Landis
patent: 7151302 (2006-12-01), Chindalore
patent: 7281231 (2007-10-01), Kan et al.
patent: 7371626 (2008-05-01), Chindalore
patent: 2002/0074660 (2002-06-01), Fukasawa
patent: 2002/0135277 (2002-09-01), Sube et al.
patent: 2002/0173111 (2002-11-01), Kasai
patent: 2003/0094642 (2003-05-01), Houston et al.
patent: 2004/0031004 (2004-02-01), Yoshioka
patent: 2004/0119164 (2004-06-01), Kurashima et al.
patent: 2004/0264837 (2004-12-01), Ogawa
patent: 2005/0110130 (2005-05-01), Kitabayashi et al.
patent: 2005/0110146 (2005-05-01), Wang
patent: 2005/0161835 (2005-07-01), Maeda
patent: 2006/0022195 (2006-02-01), Wang
patent: 2006/0055028 (2006-03-01), Hasunuma
patent: 2006/0081883 (2006-04-01), Zhang
patent: 2006/0154469 (2006-07-01), Hess et al.
patent: 2006/0154479 (2006-07-01), Lee
Abyad Mirna
Brady III Wade J.
Lin Sun J
Telecky , Jr. Frederick J.
Texas Instruments Incorporated
LandOfFree
Minimizing number of masks to be changed when changing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Minimizing number of masks to be changed when changing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Minimizing number of masks to be changed when changing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4207304