Etching a substrate: processes – Forming or treating electrical conductor article – Forming or treating of groove or through hole
Patent
1995-05-25
1999-06-29
Nuzzolillo, Maria
Etching a substrate: processes
Forming or treating electrical conductor article
Forming or treating of groove or through hole
430296, 430311, 430315, H01B 1300
Patent
active
059164514
ABSTRACT:
A device includes a ceramic substrate. A ceramic via is defined within the ceramic substrate at an actual location which differs from a designed desired location for the ceramic via. A minimal capture pad electrically communicates the actual location with the designed desired location. The minimal capture pad contains a ceramic via contact portion, a thin film stud contact portion, and a connecting portion; and each of the three is configured to be as small as permitted to limit the capacitances produced by the capture pad.
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Dougherty, W.E. "Misregistration Compensation in Multilayer Structures", IBM Technical Disclosure Bulletin, vol. 22, No. 12, May 1980.
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Athawes, W.H., Bucek, A., "MC Substrate Chrome Artwork Mask" IBM Technical Disclosure Bulletin, vol. 24, No. 3, Aug. 1981.
Perfecto Eric Daniel
Prasad Chandrika
Prasad Keshav
Robbins Gordon Jay
Swaminathan Madhavan
International Business Machines - Corporation
Nuzzolillo Maria
Weiner Laura
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