Miniature pulsed vacuum arc plasma gun and apparatus for thin-fi

Details Miniature pulsed vacuum arc plasma gun and apparatus for thin-fi Miniature pulsed vacuum arc plasma gun and apparatus for thin-fi

1994-09-14

1998-11-24

Lee, Benny

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511121, 20429804, 20429841, H01J 724

Patent

active

058412360

ABSTRACT:
A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing.

REFERENCES:
patent: 4620913 (1986-11-01), Bergman
patent: 4707637 (1987-11-01), Harvey
patent: 4713585 (1987-12-01), Ohno et al.
patent: 4714860 (1987-12-01), Brown et al.
patent: 4716340 (1987-12-01), Lee et al.
patent: 4785220 (1988-11-01), Brown et al.
patent: 4950956 (1990-08-01), Asamaki et al.

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