Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1991-09-20
1993-11-30
Hearn, Brian E.
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
118723MA, 156643, 20429831, 20429836, 20429837, 427569, 427571, 427575, H01L 2100
Patent
active
052661466
ABSTRACT:
A plasma-generating apparatus has a plasma discharge chamber having a plasma-generation region. Microwave energy is applied, while introducing plasma-forming gas, and a magnetic field is applied to the plasma-generation region by an electromagnetic coil extending around the chamber. To enhance the field in the plasma-generation region while reducing it outside said region, and a permanent magnet arrangement is at least partly located radially within the coil so as to provide a unidirectional magnetic field which extends through the whole of the plasma-generation region as seen in radial cross-section and is oriented in the axial direction of the coil.
REFERENCES:
patent: 4778561 (1988-10-01), Ghanbari
patent: 4876983 (1989-10-01), Fukuda et al.
patent: 4960073 (1990-10-01), Suzuki et al.
IEE, Transaction on Nuclear Science, NS-26, 2 (1979) pp. 2120-2127, Geller.
Hashimoto Isao
Iga Takashi
Natsui Ken'ichi
Ohno Yasunori
Sakudo Noriyuki
Goudreau George
Hearn Brian E.
Hitachi , Ltd.
LandOfFree
Microwave-powered plasma-generating apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microwave-powered plasma-generating apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microwave-powered plasma-generating apparatus and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2092651