Electric heating – Metal heating – By arc
Reexamination Certificate
2006-11-28
2006-11-28
Paschall, Mark (Department: 3742)
Electric heating
Metal heating
By arc
C219S121410, C219S121570, C118S7230MW, C204S298380, C156S345340, C156S345410
Reexamination Certificate
active
07141756
ABSTRACT:
A microwave plasma processing apparatus is disclosed that enables fast and easy plasma ignition at the pressure for plasma processing In the microwave plasma processing apparatus, a plasma ignition facilitating unit is provided to facilitate plasma ignition induced by a microwave. The plasma ignition facilitating unit includes a deuterium lamp that emits vacuum ultraviolet rays, and a transmission window that allows the vacuum ultraviolet rays to penetrate and irradiate a plasma excitation space. The transmission window is a convex lens, and focuses the vacuum ultraviolet rays to enhance ionization of the plasma excitation gas. With such a configuration, it is possible to induce plasma ignition easily and quickly.
REFERENCES:
patent: 4933602 (1990-06-01), Ono et al.
patent: 5468296 (1995-11-01), Patrick et al.
patent: 6076484 (2000-06-01), Matsumoto et al.
patent: 6150628 (2000-11-01), Smith et al.
patent: 2002/0112819 (2002-08-01), Kamarehi et al.
patent: 2002/0125226 (2002-09-01), Smith et al.
patent: 2002/0135308 (2002-09-01), Janos et al.
patent: 2003/0051990 (2003-03-01), Spielman et al.
patent: 195 32 435 (1997-03-01), None
patent: 63-158798 (1988-07-01), None
patent: 02-151021 (1990-06-01), None
patent: 06-302525 (1994-10-01), None
patent: 06-342768 (1994-12-01), None
patent: 08-022129 (1996-01-01), None
patent: 09-115694 (1997-05-01), None
patent: 10-102251 (1998-04-01), None
patent: 11-111708 (1999-04-01), None
patent: 11-168094 (1999-06-01), None
Supplementary European Search Report of EP 02 70 7230.
Goto Tetsuya
Hirayama Masaki
Ohmi Tadahiro
Sugawa Shigetoshi
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Ohmi Tadahiro
Paschall Mark
Tokyo Electron Limited
LandOfFree
Microwave plasma processing apparatus, plasma ignition... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microwave plasma processing apparatus, plasma ignition..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microwave plasma processing apparatus, plasma ignition... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3658260