Wave transmission lines and networks – Miscellaneous – Multipactor applications
Patent
1992-05-13
1992-12-15
LaRoche, Eugene R.
Wave transmission lines and networks
Miscellaneous
Multipactor applications
31511141, 315 39, 31323131, H05H 130
Patent
active
051720833
ABSTRACT:
A microwave plasma processing apparatus includes a microwave waveguide connected to a microwave power source, a mode converting wave guide and a plasma chamber. The apparatus comprises a lower induction waveguide forming part of the microwave waveguide and connected to the mode converting waveguide including, a rectangular form inlet portion, and a cylindrical portion having one of shorter side walls (E planes) placed at a control portion including a point corresponding a center point of a connecting portion connected to the plasma chamber, and the other of the shorter side walls formed into an arc shaped configuration corresponding to a circle of the connecting portion connected to the plasma chamber, the arc shaped shorter side wall is gradually expanded about the center point to establish a fan shape and form a window portion of the mode converting waveguide, and the mode converting wave guide extending between the window portion thereof to the connecting portion connected to the plasma chamber, is formed by gradually extending the arc forming the window portion toward the connecting portion and joining opposing longer side walls (H planes) to each other to establish the connecting portion connected to the plasma chamber at the end thereof where the both longer side walls meet.
REFERENCES:
patent: 4970435 (1990-11-01), Tanaka et al.
Hidaka Ryota
Kawai Yoshinobu
Koga Ryuji
Yamaguchi Toru
LaRoche Eugene R.
Neyzari Ali
Nippon Steel Corporation
LandOfFree
Microwave plasma processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microwave plasma processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microwave plasma processing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2096170