Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1991-11-27
1993-09-07
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511121, 31323131, 20429837, 20429838, H05H 118
Patent
active
052432599
ABSTRACT:
The present invention relates to a microwave plasma processing apparatus for processing such as thin film formation, etching, sputtering, and plasma oxidation, etc., on a surface of a processing object by utilizing a high density plasma generated by electron cyclotron resonance. A vacuum vessel of the apparatus, in which a microwave transmitted by a microwave guide is utilized for converting gas supplied to the vacuum vessel to plasma for the plasma processing of the processing object placed in the vacuum vessel, is formed in, such manner that the interior space of the vacuum vessel extends beyond the outer periphery of magnetic field generating coils, and the extended portion of the vessel is provided with a gas outlet for connection with an evacuation apparatus to evacuate the interior of the vacuum vessel to a desired vacuum degree. Accordingly, preferable evacuating characteristics can be obtained even in a case when a large amount of the reaction gas is supplied to the vacuum vessel in order to process a large size processing object, because the vacuum vessel in which the processing object is placed can be connected with the evacuation apparatus through a space and the same effect as if the evacuation apparatus is directly connected with the vacuum vessel is realized.
REFERENCES:
patent: 4611121 (1986-09-01), Miyamura et al.
patent: 4982138 (1991-01-01), Fujiwara et al.
patent: 5024716 (1991-06-01), Sato
patent: 5032202 (1991-07-01), Tsai et al.
patent: 5078851 (1992-01-01), Nishihata et al.
Fukuda Takuya
Hirose Shunichi
Sato Junji
Suzuki Kazuo
Todoroki Satoru
Hitachi , Ltd.
Hitachi Engineering Service
LaRoche Eugene R.
Yoo Do Hyun
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