Microwave plasma CVD apparatus with plasma generating chamber co

Details Microwave plasma CVD apparatus with plasma generating chamber co Microwave plasma CVD apparatus with plasma generating chamber co

1988-10-03

1991-04-23

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511191, 427 38, H01J 724

Patent

active

050102761

ABSTRACT:
A microwave plasma CVD apparatus which comprises a treating chamber having means for supporting a body to be treated therein, a plasma generating chamber connected to the treating chamber through a metal mesh, means for introducing a gas into the plasma generating chamber, and means for introducing microwave to convert the gas into a plasma. An embodiment thereof is characterized in that an oscillator for the microwave performs continuous oscillation, the plasma generating chamber constitutes a cylindrical cavity resonator surrounded by the metal mesh and a stop or stops, and a bell-jar smaller than the cavity in length and much smaller than the cavity in inside diameter is disposed in the cavity resonator in contact with the metal mesh to constitute a reentrant cylindrical cavity resonator through control of the position of the stop and the open area ratio of the aperture of the stop. The other embodiment is characterized in that an oscillator for the microwaves performs continuous oscillation, the plasma generating chamber constitutes a cavity surrounded by the mesh and a stop or stops, a bell-jar internally contacting the cavity is disposed in contact with the mesh, and the position of the stop and the open area ratio of the aperture of the stop are controllable according to the condition of electric discharge generated in the bell-jar, whereby the cavity resonator formed before the electric discharge and the cavity resonator formed after the discharge are formed at different positions.

REFERENCES:
patent: 4908329 (1990-03-01), Kanai et al.

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