Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1988-06-27
1989-08-15
Boudreau, Leo H.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
315 39, 31511141, 31511181, H01J 724
Patent
active
048578096
ABSTRACT:
In a microwave ion source utilizing a microwave and a magnetic field, a microwave introducing window has a multilayer structure of plates with different dielectric constants, a magnetic circuit is arranged to generate a magnetic field having a higher intensity than that defined by ECR (Electron Cyclotron Resonance) conditions so as to form a narrow high-density plasma, an ion extraction electrode has an ion extraction window whose contour falls within a center region of the narrow high-density plasma.
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Matsuo Seitaro
Shimada Masaru
Torii Yasuhiro
Watanabe Iwao
Boudreau Leo H.
Nippon Telegraph and Telephone Corporation
Razavi Michael
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