Microwave gas phase plasma source

Details Microwave gas phase plasma source Microwave gas phase plasma source

1996-08-05

1999-02-02

Pascal, Robert

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

156345, H01J 3732

Patent

active

058669868

ABSTRACT:
A plasma generator assembly for treatment of an item to be soldered in a vacuum chamber. The generator includes a chamber having a first opening for placement of a microwave source, formed so that plasma generated from a gas is spread out over a wide area; a second chamber for containing generated plasma effluent; and a partial barrier such as a perforated plate and/or an optical baffle attached to the second chamber. On the opposite side of the partial barrier from the second chamber is the area of the vacuum chamber for treatment of the item.

REFERENCES:
patent: 4939424 (1990-07-01), Kieser et al.
patent: 5047115 (1991-09-01), Charlet et al.
patent: 5499754 (1996-03-01), Bobbio et al.
patent: 5647944 (1997-07-01), Tsubaki et al.

Affiliated with

Also associated with

Rating

Microwave gas phase plasma source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Microwave gas phase plasma source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microwave gas phase plasma source will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1120350