Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1993-01-28
1994-08-02
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427578, 427579, 437235, 437238, B05D 306
Patent
active
053344235
ABSTRACT:
High quality semiconductor material is deposited in a microwave energized glow discharge deposition process by energizing a process gas with microwave energy at a power level sufficient to generate a plasma at or near the 100% saturation mode and by impeding access of deposition species to the substrate so as to lower the deposition rate to a value less than that otherwise achieved operating at the 100% saturation mode.
REFERENCES:
patent: 4504518 (1985-03-01), Ovshinsky et al.
patent: 4517223 (1985-05-01), Ovskinsky et al.
patent: 4721663 (1988-01-01), Johncock et al.
patent: 4883686 (1989-11-01), Doehler et al.
patent: 5192717 (1993-03-01), Kawakami
Guha Subhendu
Xu XiXiang
Yang Chi C.
King Roy V.
United Solar Systems Corp.
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