Microstructures and single mask, single-crystal process for fabr

Details Microstructures and single mask, single-crystal process for fabr Microstructures and single mask, single-crystal process for fabr

1998-08-11

2000-04-18

Mintel, William

Active solid-state devices (e.g., transistors, solid-state diode

Responsive to non-electrical signal

Physical deformation

257418, 257420, 257622, 7351421, 7351423, 7351436, 7351437, 73DIG1, 438 52, H01L 2982

Patent

active

060518669

ABSTRACT:
A single mask, low temperature reactive ion etching process for fabricating high aspect ratio, released single crystal microelectromechanical structures independently of crystal orientation.

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