Microscope and sample observation method

Details Microscope and sample observation method Microscope and sample observation method

2007-11-06

2009-08-18

Fineman, Lee (Department: 2872)

Optical: systems and elements

Compound lens system

Microscope

C359S368000

Reexamination Certificate

active

07576910

ABSTRACT:
For a semiconductor device S as an inspected object, there are provided an image acquisition part1, an optical system2including an objective lens20, and a solid immersion lens (SIL)3movable between an insertion position including an optical axis from the semiconductor device S to the objective lens20and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL3is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index n0and a thickness t0of a substrate of the semiconductor device S, and a second mode in which the SIL3is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index n0and thickness t0of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1of SIL3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.

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ISTFA 2003 “Photoemission and OBIRCH Analysis With Solid Immersion Lens (SIL)”, ISTFA 2003, pp. 1-20.
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