Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1996-11-26
1998-10-20
Breneman, R. Bruce
Etching a substrate: processes
Etching of semiconductor material to produce an article...
438 53, 257417, 7351432, H01L 21306, H01G 700
Patent
active
058242333
ABSTRACT:
A micromechanical component includes a fixed micromechanical structure having a pair of capacitor plates being formed of one or more conductive layers, and a movable micromechanical structure being formed of a dielectric layer to be introduced into or removed from an interstice between the plates. A capacitance change is obtained through the resilient or freely movable dielectric, so that the component can be inserted as a proportional or a non-proportional force sensor. A microsystem with an integrated circuit and a micromechanical component with a movable dielectric, as well as a production method for the component and the microsystem, are also provided.
REFERENCES:
patent: 4530029 (1985-07-01), Beristain
patent: 4901586 (1990-02-01), Blake et al.
patent: 5332469 (1994-07-01), Mastrangelo
Adjodha Michael E.
Breneman R. Bruce
Greenberg Laurence A.
Lerner Herbert L.
Siemens Aktiengesellschaft
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