Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2006-05-09
2006-05-09
Hassanzadeh, Parviz (Department: 1763)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
Reexamination Certificate
active
07041225
ABSTRACT:
A method of manufacturing a micromechanical component having the following steps is described: providing a substrate (1); providing a first micromechanical functional layer (5) on the sacrificial layer (4); structuring the first micromechanical functional layer (5) in such a manner that it is provided with a mobilizable sensor structure (6); providing and structuring a first sealing layer (8) on the structured first micromechanical functional layer (5); providing and structuring a second micromechanical functional layer (10) on the first sealing layer (8) which has at least a covering function and is at least partially anchored in the first micromechanical functional layer (5); making the sensor structure (6) movable and providing a second sealing layer (8) on the second micromechanical functional layer (10). A corresponding micromechanical component is also described.
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Culbert Roberts
Hassanzadeh Parviz
Kenyon & Kenyon,LLP
Robert & Bosch GmbH
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