Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1995-06-07
1997-10-14
Dang, Thi
Etching a substrate: processes
Etching of semiconductor material to produce an article...
216 11, 216 49, 216 51, 216 95, 216 99, 216100, B05B 500
Patent
active
056768508
ABSTRACT:
The present invention pertains to a method for making a plurality of barbs. The method is comprised of the steps of first forming a substrate of a first material with a layer of a second material thereon, and at predetermined discrete locations on the layer a third material. Next, there is the step of removing portions of the layer and the substrate such that a frustrum shape is formed on the surface of the substrate. Next, there is the step of removing the third material but leaving the first and second materials essentially untouched. Then, there is the step of reforming the layer made of the second material on the frustrum surface of the substrate. Next, there is the step of removing portions of the layer at essentially the center of the lowest points of the frustrum. There is then the step of removing portions of the substrate but not the second material such that a plurality of barbs is created.
REFERENCES:
patent: 4113549 (1978-09-01), Brimm
patent: 5393375 (1995-02-01), MacDonald et al.
Reed Michael L.
Weiss Lee E.
Carnegie Mellon University
Dang Thi
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