Micromachined electron or ion-beam source and secondary...

Radiant energy – Inspection of solids or liquids by charged particles

Reexamination Certificate

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C250S216000, C073S105000

Reexamination Certificate

active

07960695

ABSTRACT:
An e-beam or ion beam imaging and exposure system is built into the end of an AFM cantilever which images using the scanning capabilities built into the AFM. In one embodiment, a boron doped diamond cold cathode is formed into the cantilever with an associated accelerating electrode and secondary electron collection electrode. The assembly is brought within a few nanometers of the object to be imaged or exposed using the AFM. One or more gas channels built into the cantilever assembly provide a positive pressure of inert gas to prevent oxidative erosion of the cold cathode and can bleed any surface charge build up on the sample surface. After secondaries are collected the cantilever is moved to the next area to be exposed.

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