Micromachine and manufacturing method

Details Micromachine and manufacturing method Micromachine and manufacturing method

2007-03-13

2007-03-13

Quach, T. N. (Department: 2826)

Semiconductor device manufacturing: process

Making passive device

C438S780000, C257S414000

Reexamination Certificate

active

11243550

ABSTRACT:
In a micromachine according to this invention, a polyimide film is formed on the surface of each electrode. The polyimide film is formed as follows. A substrate having each electrode and a counterelectrode are dipped in an electrodeposition polyimide solution, and a positive voltage is applied to the electrode. A material dissolved in the electrodeposition polyimide solution is deposited on a surface of the positive-voltage-applied electrode that is exposed in the solution, thus forming a polyimide film on the surface.

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