Microlithography projection objective including deformable...

Details Microlithography projection objective including deformable... Microlithography projection objective including deformable...

2007-11-13

2007-11-13

Luu, Thanh X. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

C359S849000

Reexamination Certificate

active

11533632

ABSTRACT:
A catadioptric projection objective for microlithography has at least one curved mirror that is deformable and adjusting elements that can deform the deformable mirror. The adjusting elements are matched to given image errors and their correction. The invention is suitable for astigmatism, fourfold wavefront-deformations due to lens heating, compaction, and the like.

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