Microlithographic substrate cleaning and compositions therefor

Details Microlithographic substrate cleaning and compositions therefor Microlithographic substrate cleaning and compositions therefor

1992-08-24

1994-11-08

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Processing feature prior to imaging

430331, 134 33, 134 38, 427240, 427273, B05D 512, G03C 500

Patent

active

053626087

ABSTRACT:
THFA (tetrahydrofurfuryl alcohol) is employed as the active component of edge bead removal compositions negating the need for N-methylpyrrolidone and providing unexpected effectiveness for multilayer microelectronic edge beads having at least one highly polar aromatic polymer layer, particularly when such layer is adjacent to an acid-catalyzed photoresist.

REFERENCES:
patent: 4113492 (1978-09-01), Sato
patent: 4271261 (1981-06-01), Shimizu
patent: 4510176 (1985-04-01), Cuthbert
patent: 4518678 (1985-05-01), Allen
patent: 4664721 (1987-05-01), Valasek
patent: 5139607 (1992-08-01), Ward

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