Microlithographic projection exposure apparatus with...

Details Microlithographic projection exposure apparatus with... Microlithographic projection exposure apparatus with...

2006-07-18

2010-02-16

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S067000

Reexamination Certificate

active

07663735

ABSTRACT:
A microlithographic projection exposure apparatus includes an illumination system and a projection lens which images a reticle onto a photosensitive layer. The projection exposure apparatus further includes an immersion arrangement for introducing an immersion liquid into an immersion interspace between a last optical element of the projection lens on the image side and the photosensitive layer. A transmission filter is designed and arranged in the projection lens in such a way that rays which enter the immersion interspace from the last optical element at an angle of incidence α are attenuated more strongly the smaller the angle of incidence α is. The transmission filter may be arranged e.g. in a pupil plane of the projection lens and may have a transmittance which increases with increasing distance from an optical axis of the projection lens. In this way compensation is provided for angle-dependent absorption in the immersion liquid.

REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 6507389 (2003-01-01), Yeh
patent: 2001/0026360 (2001-10-01), Baker et al.
patent: 2002/0008863 (2002-01-01), Taniguchi et al.
patent: 2004/0114117 (2004-06-01), Bleeker
patent: WO01/2907 (2001-01-01), None
patent: WO03/092256 (2003-11-01), None
International Search Report PCT/EP2004/001779.

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