Microlithographic projection exposure apparatus

Details Microlithographic projection exposure apparatus Microlithographic projection exposure apparatus

2008-06-25

2010-10-19

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

07817250

ABSTRACT:
The disclosure relates to a microlithographic projection exposure apparatus, as well as related components and methods. In some embodiments, a microlithographic projection exposure apparatus includes an illumination system and a projection objective, where the illumination system can illuminate an object plane of the projection objective and the projection objective can produce the image of the object plane on an image plane. A polarization-dependent transmission can be produced in the illumination system such that, for at least one polarization distribution in respect of the light impinging on the object plane, a non-homogeneous intensity distribution in the object plane is obtained. The non-homogeneous intensity distribution can afford a homogeneous intensity distribution in the image plane by virtue of polarization-dependent transmission properties of the projection objective.

REFERENCES:
patent: 6466303 (2002-10-01), Omura et al.
patent: 6774984 (2004-08-01), Gerhard et al.
patent: 7027235 (2006-04-01), Koehler et al.
patent: 7053988 (2006-05-01), Totzeck et al.
patent: 7206060 (2007-04-01), Mori
patent: 7511886 (2009-03-01), Schultz et al.
patent: 2005/0152046 (2005-07-01), Gruner et al.
patent: 1 840 945 (2007-10-01), None
patent: WO 2005/031467 (2005-04-01), None
patent: WO 2005/050325 (2005-06-01), None
patent: WO 2006/077849 (2006-07-01), None

Affiliated with

Also associated with

Rating

Microlithographic projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Microlithographic projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microlithographic projection exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4236250