Microlens manufacturing method and solid-state image pick-up...

Details Microlens manufacturing method and solid-state image pick-up... Microlens manufacturing method and solid-state image pick-up...

2007-12-18

2007-12-18

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S319000, C430S328000, C430S330000

Reexamination Certificate

active

11359474

ABSTRACT:
A method of manufacturing a microlens comprising the steps of: (a) applying a resist for an excimer laser, an ultraviolet exposure or an electron beam onto a surface, and carrying out an exposure with a light in an ultraviolet region or an electron beam and a development, so as to form a patterned resist; (b) heat treating the resist patterned at the step (a) to give a shape of a microlens; and (c) implanting an ion in a plurality of directions into at least a surface portion of the resist to which the shape of the microlens is given at the step (b), to obtain a microlens having a heat resistance.

REFERENCES:
patent: 6127668 (2000-10-01), Baek
patent: 4-184970 (1992-07-01), None
patent: 10-148704 (1998-06-01), None
patent: 2005- 101452 (2005-04-01), None

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