Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2007-06-18
2010-12-14
Ahmed, Shamim (Department: 1713)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S037000, C438S048000, C438S053000, C137S015010, C137S013000
Reexamination Certificate
active
07850861
ABSTRACT:
A method of making a microfluidic device is provided. The method features patterning a permeable wall on a substrate, and surrounding the permeable wall with a solid, non-permeable boundary structure to establish a microfluidic channel having a cross-sectional dimension less than 5,000 microns and a cross-sectional area at least partially filled with the permeable wall so that fluid flowing through the microfluidic channel at least partially passes through the permeable wall.
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Ahmed Shamim
Angadi Maki A
Homer Mark
The United States of America as represented by the Administrator
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