Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2005-03-08
2005-03-08
Olsen, Allan (Department: 1763)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S039000, C216S056000, C216S057000, C216S079000, C216S099000, C204S403080, C204S516000, C204S518000, C436S071000, C436S072000, C427S002230, C427S245000
Reexamination Certificate
active
06863833
ABSTRACT:
The invention provides microfabricated silicon substrates and devices having extremely small apertures (termed “nanoapertures”) and methods for producing such nanoapertures. The devices have a nanoaperture (which may have a diameter ranging from about a few millimeters to as small as a few nm) across a substrate effective to connect two regions separated by the substrate. The devices are suitable for the formation of lipid bilayer membranes across the apertures, and for use in devices such as biosensors. Substrates and devices may include multiple nanoapertures, which may each support a lipid bilayer membrane, allowing fault tolerant devices such as fault-tolerant biosensors, and allowing devices able to sense more than one target molecule.
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Bloom David M.
Peterman Mark C.
Ziebarth Jonathan M.
Olsen Allan
The Board of Trustees of the Leland Stanford Junior University
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