Microelectromechanical system and process of making the same

Details Microelectromechanical system and process of making the same Microelectromechanical system and process of making the same

2011-05-03

2011-05-03

Bryant, Kiesha R (Department: 2891)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Physical stress responsive

C257S415000, C216S002000

Reexamination Certificate

active

07935556

ABSTRACT:
A micro electromechanical system and a fabrication method thereof, which has trenches formed on a substrate to prevent circuits from interfering each other, and to prevent over-etching of the substrate when releasing a microstructure.

REFERENCES:
patent: 5963788 (1999-10-01), Barron et al.
patent: 6064118 (2000-05-01), Sasaki
patent: 6218282 (2001-04-01), Buynoski
patent: 7138694 (2006-11-01), Nunan et al.
patent: 2002/0148807 (2002-10-01), Zhao et al.
patent: 2004/0077178 (2004-04-01), Yang et al.
patent: 2006/0105543 (2006-05-01), Xiao et al.

Affiliated with

Also associated with

Rating

Microelectromechanical system and process of making the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Microelectromechanical system and process of making the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microelectromechanical system and process of making the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2650195