Microcontact printing method using imprinted nanostructure...

Etching a substrate: processes – Forming or treating an article whose final configuration has...

Reexamination Certificate

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C216S041000, C264S001100, C264S319000, C101S483000

Reexamination Certificate

active

07442316

ABSTRACT:
A microcontact printing method using an imprinted nanostructure is provided, wherein the microcontact printing is introduced to a nanoimprint lithography process to pattern a self-assembled monolayer (SAM). The method includes forming a nanostructure on a substrate by using the nanoimprint lithography process; and patterning the nanostructure with the microcontact printing method. The operation of patterning includes: depositing a metal thin film on the nanostructure; contacting a plate with the nanostructure to selectively print the SAM on the nanostructure, wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure; selectively removing the metal thin film by using the SAM as a mask; removing the SAM from the nanostructure; and patterning the substrate by using the remaining metal thin film on the nanostructure as a mask.

REFERENCES:
patent: 2002/0130444 (2002-09-01), Hougham
patent: 2004/0124566 (2004-07-01), Sreenivasan et al.
patent: 2005/0082700 (2005-04-01), Deeman et al.
patent: 2005/0120902 (2005-06-01), Adams et al.
patent: 2005/0133954 (2005-06-01), Homola
patent: 2005/0186774 (2005-08-01), Gurumurthy

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