Etching a substrate: processes – Gas phase etching of substrate – Irradiating – ion implanting – alloying – diffusing – or...
Patent
1998-06-17
1999-11-23
Breneman, Bruce
Etching a substrate: processes
Gas phase etching of substrate
Irradiating, ion implanting, alloying, diffusing, or...
216 2, 216 27, 216 39, 216 67, 216 87, 438734, 438735, 438753, H01L 2100, B44C 122
Patent
active
059894458
ABSTRACT:
Microchannels for conducting and expelling a fluid are embedded in a surface of a silicon substrate. A channel seal is made of plural cross structures formed integrally with the silicon substrate. The cross structures are arranged sequentially over each channel, each cross structure having a chevron shape. The microchannel is sealed by oxidizing at least partially the cross structures, whereby the spaces therebetween are filled. A dielectric seal which overlies the thermally oxidized cross structures forms a complete seal and a substantially planar top surface to the silicon substrate. The dielectric seal is formed of a low pressure chemical vapor deposition (LPCVD) dielectric layer. The channel is useful in the production of an ink jet print in head, and has a polysilicon heater overlying the dielectric seal. A current passing through the heater causes a corresponding increase in the temperature of the ink in the microchannel, causing same to be expelled therefreom. After expulsion of the fluid, the microchannel is refilled by capillary action. Control circuitry, including bonding pads and sensors, can be formed integrally on the silicon substrate. In drug or chemical delivery systems, sensors and/or stimulation circuitry for sensing or inducing neural and other response can be formed directly in the silicon substrate which contains the microchannel. The sensor is disposed in close proximity to the chemical distribution nozzle, facilitating neural and other studies. Microvalve arrangements can be formed with the microchannel, controlled by the on-chip circuitry.
REFERENCES:
patent: 3921916 (1975-11-01), Bassous
patent: 4455192 (1984-06-01), Tamai
patent: 5308442 (1994-05-01), Taub et al.
patent: 5385635 (1995-01-01), O'Neill
patent: 5585827 (1996-12-01), Murakami
patent: 5588597 (1996-12-01), Reinecke et al.
"A Novel Fabrication Method of Capillary Tubes on Quartz for Chemical Analysis Applications," by Kaplan, et al., IEEE Proceedings, Micro Electro Mechanical Systems, Jan. 25-28, 1994.
"Silicon Processed Microneedles," by Lin, et al., The 7.sup.th International Conference on Solid State Sensors and Actuators; Jun. 7-10, 1993.
Chen Jingkuang
Wise Kensall D.
Breneman Bruce
Powell Alva C
The Regents of the University of Michigan
LandOfFree
Microchannel system for fluid delivery does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Microchannel system for fluid delivery, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Microchannel system for fluid delivery will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1217342