Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reexamination Certificate
2004-10-18
2008-11-11
Olsen, Allan (Department: 1792)
Etching a substrate: processes
Etching of semiconductor material to produce an article...
C216S056000
Reexamination Certificate
active
07449122
ABSTRACT:
An electrokinetic pump for pumping a liquid includes a pumping body having a plurality of narrow, short and straight pore apertures for channeling the liquid through the body. A pair of electrodes for applying a voltage differential are formed on opposing surfaces of the pumping body at opposite ends of the pore apertures. The pumping body is formed on a support structure to maintain a mechanical integrity of the pumping body. The pump can be fabricated using conventional semiconductor processing steps. The pores are preferably formed using plasma etching. The structure is oxidized to insulate the structure and also narrow the pores. A support structure is formed by etching a substrate and removing an interface oxide layer. Electrodes are formed to apply a voltage potential across the pumping body. Another method of fabricating an electrokinetic pump includes providing etch stop alignment marks so that the etch step self-terminates.
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Corbin David
Goodson Kenneth
Kenny Thomas
Santiago Juan
Zeng Shulin
Cooligy Inc.
Haverstock & Owens LLP
Olsen Allan
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