Micro-electro-mechanical system device and method for making...

Details Micro-electro-mechanical system device and method for making... Micro-electro-mechanical system device and method for making...

2011-08-23

2011-08-23

Landau, Matthew (Department: 2813)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Physical stress responsive

C438S667000, C438S050000, C438S052000

Reexamination Certificate

active

08003422

ABSTRACT:
According to the present invention, a micro-electro-mechanical system (MEMS) device comprises: a thin film structure including at least a metal layer and a protection layer deposited in any order; and a protrusion connected under the thin film structure. A preferred thin film structure includes at least a lower protection layer, a metal layer and an upper protection layer. The MEMS device for example is a capacitive MEMS acoustical sensor.

REFERENCES:
patent: 6535460 (2003-03-01), Loeppert et al.
patent: 7049051 (2006-05-01), Gabriel et al.
patent: 7190038 (2007-03-01), Dehe et al.
patent: 2007/0114622 (2007-05-01), Adkisson et al.
“Development of New Generation Microphone” China Academic Journal Electronic Publishing House.

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