Micro-electro-mechanical structure having electrically...

Details Micro-electro-mechanical structure having electrically... Micro-electro-mechanical structure having electrically...

2005-07-07

2008-10-21

Noland, Thomas P (Department: 2856)

Measuring and testing

Speed, velocity, or acceleration

Angular rate using gyroscopic or coriolis effect

C073S504120, C216S013000, C257S618000, C438S050000

Reexamination Certificate

active

07437933

ABSTRACT:
Micro-electro-mechanical structure formed by a substrate of semiconductor material and a suspended mass extending above the substrate and separated therefrom by an air gap. An insulating region of a first electrically insulating material extends through the suspended mass and divides it into at least one first electrically insulated suspended region and one second electrically insulated suspended region. A plug element of a second electrically insulating material different from the first electrically insulating material is formed underneath the insulating region and constitutes a barrier between the insulating region and the air gap for preventing removal of the insulating region during fabrication, when an etching agent is used for removing a sacrificial layer and forming the air gap.

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Yan, G., et al., “Integrated Bulk-Micromachined Gyroscope Using Deep Trench Isolation Technology,”IEEE, pp. 605-608, 2004.

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