Micro-electro mechanical device made from mono-crystalline silic

Details Micro-electro mechanical device made from mono-crystalline silic Micro-electro mechanical device made from mono-crystalline silic

1998-12-11

2000-05-09

Bowers, Charles

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Physical stress responsive

438 52, 438 53, 438725, 257417, 216 2, H01L 2100, H01L 21302, H01L 21461, H01L 2982, B24B 100

Patent

active

060603364

ABSTRACT:
A micro-electro-mechanical device and method of manufacture therefore with a suspended structure formed from mono-crystalline silicon, bonded to a substrate wafer with an organic adhesive layer serving as support and spacer and the rest of the organic adhesive layer serving as a sacrificial layer, which is removed by a dry etch means. Said substrate wafer may contain integrated circuits for sensing and controlling the device.

REFERENCES:
patent: 3626256 (1971-12-01), Brown
patent: 5314572 (1994-05-01), Core et al.
patent: 5576250 (1996-11-01), Diem et al.
patent: 5710057 (1998-01-01), Kenney
patent: 5725729 (1998-03-01), Greiff
patent: 5780885 (1998-07-01), Diem

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