Micellar technology for post-etch residues

Details Micellar technology for post-etch residues Micellar technology for post-etch residues

2006-03-28

2006-03-28

Norton, Nadine G. (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S750000, C438S754000

Reexamination Certificate

active

07018939

ABSTRACT:
A method is provided herein for cleaning a semiconductor device. In accordance with the method, a semiconductor device is provided (11), and a micellar solution is applied (13) to the semiconductor device. The method is particularly useful for cleaning copper and silicon surfaces and removing processing residues from the surfaces of vias or trenches.

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