Data processing: measuring – calibrating – or testing – Measurement system – Dimensional determination
Reexamination Certificate
2007-12-04
2007-12-04
Barlow, John (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system
Dimensional determination
C438S014000
Reexamination Certificate
active
11307640
ABSTRACT:
A method of preparing recipes for operating a metrology tool, each recipe including a set of instructions for measuring dimensions in a microelectronic feature. A database includes a plurality of known instructions with best known methods for measuring different feature dimensions by creating a summary of a recipes used by the tool, and adding categorization attributes to identify the summary for retrieval from the database. There is provided a desired recipe having instructions for measuring desired dimensions, including a summary of parameters relating to tool function for the feature dimension to be measured. The method includes comparing the instructions in the desired recipe with the instructions in the database, identifying differences therebetween, modifying the desired recipe instructions to conform to the database instructions, verifying the desired recipe prior to using the modified desired recipe by the tool, and using the desired recipe to execute a feature measurement on the tool.
REFERENCES:
patent: 5835227 (1998-11-01), Grodnensky et al.
patent: 6041270 (2000-03-01), Steffan et al.
patent: 6055045 (2000-04-01), Weill et al.
patent: 6268227 (2001-07-01), Toprac
patent: 6345211 (2002-02-01), Yu
patent: 6388253 (2002-05-01), Su
patent: 6415193 (2002-07-01), Betawar et al.
patent: 6430572 (2002-08-01), Steffan et al.
patent: 6432760 (2002-08-01), Kothandaraman et al.
patent: 6535774 (2003-03-01), Bode et al.
patent: 6587744 (2003-07-01), Stoddard et al.
patent: 6625513 (2003-09-01), Lymberopoulos et al.
patent: 6650958 (2003-11-01), Balazs et al.
patent: 6694210 (2004-02-01), Toh
patent: 6708074 (2004-03-01), Chi et al.
patent: 6735493 (2004-05-01), Chou et al.
patent: 6747734 (2004-06-01), Ritzdorf et al.
patent: 6756164 (2004-06-01), Franke et al.
patent: 6804014 (2004-10-01), Markle et al.
patent: 6808942 (2004-10-01), Patel et al.
patent: 6829056 (2004-12-01), Barnes et al.
patent: 6834370 (2004-12-01), Brandl et al.
patent: 6836691 (2004-12-01), Stirton
patent: 6858361 (2005-02-01), Mui et al.
patent: 6889113 (2005-05-01), Tasker et al.
patent: 6968245 (2005-11-01), Hsu et al.
patent: 6978189 (2005-12-01), Bode et al.
patent: 6999848 (2006-02-01), Helwig
patent: 7047101 (2006-05-01), Young et al.
patent: 7052919 (2006-05-01), Oh
patent: 7065425 (2006-06-01), Kay et al.
patent: 7076321 (2006-07-01), Purdy
patent: 7096086 (2006-08-01), Sato
patent: 7158851 (2007-01-01), Funk
patent: 7173268 (2007-02-01), Tanaka et al.
patent: 7207017 (2007-04-01), Tabery et al.
patent: 2002/0177245 (2002-11-01), Sonderman et al.
patent: 2002/0193902 (2002-12-01), Shanmugasundram et al.
patent: 2004/0078107 (2004-04-01), Chou et al.
patent: 2004/0203321 (2004-10-01), Tsuchiyama et al.
patent: 2005/0053846 (2005-03-01), Shin et al.
patent: 2005/0143853 (2005-06-01), Akimori et al.
patent: WO2004059247 (2004-07-01), None
Chain et al., In-Line Electrical Probe for CD Metrology Below 0.5 micrometer, 1995 IEEE, pp. 76-80.
Imai et al., Development of Equipment-Installed APC System and Critical Dimension Control Technology of Gate-Hard-Mask Etching Using Its System, 2005, IEEE, pp. 139-142.
Chain et al., In-Line ElectricalProbe for CD Metrology Below 0.5 micrometer, 1995 IEEE/SEMI Advanced Semiconductor Manufacturing Conference, pp. 76-80.
W. Banke and C. Archie, “Characteristics of accuracy for CD metrology,” Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, Editor, Proceedings of SPIE, vol. 3677, pp. 291-308, 1999.
Ahmed Ejaj
Archie Charles N.
Goodrich Stephen W.
Solecky Eric P.
Vakas Georgios A.
Barlow John
DeLio & Peterson LLC
International Business Machines - Corporation
Jacklitsch Lisa U.
Peterson Peter W.
LandOfFree
Metrology tool recipe validator using best known methods does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Metrology tool recipe validator using best known methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metrology tool recipe validator using best known methods will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3838644